A quantitative investigation of the process parameter when structuring the photosensitive glass Foturanº is presented. Exposure dºses in the range of 1.5%-100%(relative units) were experimented and features in the range 0.01-1.2 mm have been patterned. The latent image has been investigated after annealing in order tº identify the optimal exposure conditions, Size and roughness have been measured in the exposed zones, Enlargements of the features frºm 0.001 mm up to 0.01 mm have been noticed independent on the size, due mainly to the light diffraction at the mask edges and limiting the smallest patterned feature width at 0.01 mm.
23 Jun 2005
Sensors And Microsystems-Proceedings Of The 9th Italian Conference