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The self-assembly of asymmetric polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) block copolymer based nanoporous thin films over a broad range of molar mass (Mn) between 39 kg·mol–1 and 205 kg·mol–1 is obtained by means of a simple thermal treatment. In the case of standard thermal treatments, the self-assembly process of block copolymers is hindered at small Mn by thermodynamic limitations and by a large kinetic barrier at high Mn. We demonstrate that a fine tuning of the annealing parameters, performed by a Rapid Thermal Processing (RTP) machine, permits us to overcome those limitations. Cylindrical features are obtained by varying Mn and properly changing the corresponding annealing temperature, while keeping constant the annealing time (900 s), the film thickness (∼30 nm), and the PS fraction (∼0.7). The morphology, the characteristic dimensions (i.e., the pore diameter d and the …
American Chemical Society
Publication date: 
7 May 2014

Federico Ferrarese Lupi, Tommaso Jacopo Giammaria, Gabriele Seguini, Francesco Vita, Oriano Francescangeli, Katia Sparnacci, Diego Antonioli, Valentina Gianotti, Michele Laus, Michele Perego

Biblio References: 
Volume: 6 Issue: 10 Pages: 7180-7188
ACS applied materials & interfaces