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The self-assembly of block copolymer (BCP) thin films produces dense and ordered nanostructures. Their exploitation as templates for nanolithography requires the capability to control the lateral order of the nanodomains. Among a multiplicity of polymers, the widely studied all-organic polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP can easily form nanodomains perpendicularly oriented with respect to the substrate, since the weakly unbalanced surface interactions are effectively neutralized by grafting to the substrate an appropriate poly(styrene-random-methyl methacrylate) P(S-r-MMA) random copolymer (RCP). This benefit along with the selective etching of the PMMA component and the chemical similarity with the standard photoresist materials deserved for PS-b-PMMA the role of BCP of choice for the technological implementation in nanolithography. This work demonstrates that the synergic …
American Chemical Society
Publication date: 
30 Mar 2016

Gabriele Seguini, Fabio Zanenga, Tommaso J Giammaria, Monica Ceresoli, Katia Sparnacci, Diego Antonioli, Valentina Gianotti, Michele Laus, Michele Perego

Biblio References: 
Volume: 8 Issue: 12 Pages: 8280-8288
ACS applied materials & interfaces