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Type: 
Journal
Description: 
X‐ray Photoelectron Spectroscopy (XPS) was used to investigate the silicon nitride composition in stacked Si oxide/Si nitride/Si oxide nano‐layers. The standard approach for stoichiometry estimation, valid for homogeneous compositions, was corrected for the case of very small thickness and thin overlayer. Copyright © 2012 John Wiley & Sons, Ltd.
Publisher: 
John Wiley & Sons, Ltd
Publication date: 
1 Aug 2012
Authors: 

E Ravizza, S Spadoni, R Piagge, P Comite, C Wiemer

Biblio References: 
Volume: 44 Issue: 8 Pages: 1209-1213
Origin: 
Surface and Interface Analysis